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ʯīϩ,ʯīϩİl(f)F(xin)vʷY(ji)(gu)Ƃ䷽(yng)
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ʯīϩ,ʯīϩİl(f)F(xin)vʷY(ji)(gu)Ƃ䷽(yng)  2011/10/3

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  • ڱ|(zh)ϣʯīϩǷx(li)Ćԭӌƽʯī@f(shu)ԏ20o(j)X侀wW(xu)Ą(chung)ԁ(li)ƌW(xu)Ҿѽ(jng)_ʼ|ʯīϩˡ1918V. Kohlschtter P. HaenniԔ(x)ʯī(|(zh)graphite oxide paper[8]1948G. Ruess F. Vogtl(f)ô͸ʽ@΢RĔzٌʯīϩӔ(sh)310֮gʯīϩD[9]

    P(gun)ʯīϩcl(f)F(xin)ƌW(xu)ԇʹûW(xu)xchemical exfoliation method(li)ʯīϩԭӻǶʯīõʯīgSY(ji)(gu)ÿһʯīԱҕΌʯīϩ(jng)^W(xu)(yng)̎ȥǶĴԭӻӺ(hu)õһʯīϩyԷc@Ѡ|(zh)ƌW(xu)Ҳ]^m(x)@о߀һЩƌW(xu)ҲûW(xu)eʯīϩĤL(zhng)epitaxial growthڸNӻ壨substrateƷ|(zh)(yu)[10]

    2004˹شW(xu)Ͷ(gu)РZ΢W(xu)ԺInstitute for Microelectronics TechnologyăɽMF(tun)(du)ͬȷxΪ(d)ʯīϩƽ[11]ķ͈F(tun)(du)ɆTżȻذl(f)F(xin)һN(jin)еƂʯīϩ·ʯīƬzУ ۯBzճסʯīƬăɂ(c)˺_zƬҲS֮һ֞؏(f)@һ^ͿԵõԽ(li)ԽʯīƬв֘ƷHһ̼ԭӘ(gu)ɡƵʯīϩ(dng)ȻHHƂDzͨʯīϩ(hu)[һʯī?jin)yÕ(hu)һؾoNڻҪҵ(sh)(yn)(sh)ʯīϩq|ڷС1 cm2ą^(q)(ni)ʹǕr(sh)ļ˿Ƽo(w)ҵķEʯĥϩһȵĹƬ ùⲨĸЧ(yng)ͿЧʹùW(xu)@΢Rҵ@Щʯīϩ@һ(g)dz(zhn)Č(sh)(yn)ĺ^5%_(sh)ֵ300nm315nm͟o(w)^y(c)Όʯīϩ[10]

    W(xu)оڸNͬϻʯīϩĿҊȺ͌(du)ȶȣͬr(sh)ҲṩһN(jin)пҊ(qing)[12]ʹ@΢W(xu)Raman microscopyļg(sh)J(rn)ҲӺYxЧ[13]

    2005ͬ˹شW(xu)F(tun)(du)c炐ȁW(xu)оC(sh)ʯīϩĜ(zhn)ӣquasiparticleǟo(w)|(zh)M(fi)ӣDirac fermion@ӵİl(f)F(xin)һоʯīϩğᳱǕr(sh)ϰλŌW(xu)惞(yu)о̤M(jn)@I(lng)

    F(xin)֪ÿ(dng)ʯīĥr(sh)UPr(sh)͕(hu)΢СʯīϩƬƳͬr(sh)Ҳ(hu)a(chn)һњ?jin)[11]2004/05ǰ]ע⵽@Щ?jin)Ƭʲô̎ʯīϩİl(f)F(xin)(yng)ԓwںķF(tun)(du)[14]?yu)wW(xu)l(f)һwW

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